离子束及溅射沉积粒子交互作用对膜基界面的影响

Ion beam enhanced deposition (IBED) as a combined process of coating and implantation cannot simply use the criterion of ion mixing for implantation, of which dynamic recoiling at high energy level would be crucial to achieve a promising interface layer. In addition to energy level during IBED, the ion current and the interaction of incident particles with the heterogeneous structure of the substrate should be taken into consideration. If the substrate is high carbon steel, the different structures hold different sputtering rates and the selected sputtering would result in enrichment of carbon and lead to the decrease of bonding strength and the increase of roughness as well. In this case the bombarding energy is suggested to be in the medium or low energy level with static recoiling. At the low energy level the increase of ion current would increase the adhesion. In addition, the effects of bombarding energy on coating structure (texture), hardness, wear volume, electro-chemical aspects were studied. The criteria of different bonding strength testing methods were also compared. 10 technical papers have been completed and 7 of them were published.

研究不同能量及束流密度的单一或混合离子束与其他溅射沉积原子或原子团的交互作用对异质基材表面共混层深和选择溅射的影响。着重考核这种交互作用在随后的镀膜沉积过程中对膜基结合强度以及离子辅助轰击参数对镀层致密性及韧性的相互关系。结合组织成分微观分析对离子束增强沉积界面共混，镀层沉积工艺以及设备的选择提供依据。