图案化润湿表面免显影制备策略的涂层材料设计与调控机理研究

Surfaces with patterned wettability exhibit important potential applications in various fields, while their industrialization are limited by poor durability of surface performance and environment concern caused by complicated preparation processes. This project aims to pattern wettability by utilizing the competition between surface reconstruction and curing under different curing methods, based on novel UV curable coatings with excellent omniphobicity and self-replenishing property. Ultimately developing-free lithography technology and matching coatings for preparation of surfaces with patterned wettability, will be constructed through design of functional grafted copolymers and coating formulation as well as investigation of their impacts on surface reconstruction. The implementation of this project helps to improve durability of patterned surfaces and avoid developing process in traditional lithography making the preparation process more convenient, economical and environmentally friendly. In addition it also provides new strategies for development of novel surface functional materials.

图案化润湿表面在诸多领域具有重要应用价值，然而表面润湿性能耐久性不足以及复杂制备工艺带来的环保问题严重限制了其产业化进程。本项目拟以具有优异双疏性质和自补给性能的新型光固化涂料为基础，利用不同固化方式下涂层表面重构与固化之间的竞争实现对润湿性质的图案化。通过功能接枝共聚物的结构设计、涂层配方设计以及其对表面重构调控规律的研究，最终形成图案化润湿表面的免显影光刻制备技术以及配套的涂层材料。本项目的开展一方面有助于提升图案化润湿表面性能的耐久性，另一方面避免了传统光刻技术中的溶剂显影过程，制备工艺更加简便、经济、环保，有助于图案化润湿表面功能材料实现其产业价值，同时也为新型表面功能材料的开发提供新的思路。

图案化润湿表面的制备一般都涉及溶剂显影步骤，而显影过程会带来环保和健康问题。本项目提出通过聚二甲基硅氧烷(PDMS)接枝共聚物的结构设计，制备既可光固化又能热固化的自清洁涂料，利用不同固化方式对表面自清洁性能的不同影响，实现免显影制备图案化润湿表面。在项目执行过程中，我们首先优化了聚二甲基硅氧烷接枝共聚物的合成方法，开发了多元醇与PDMS接枝共聚物的一锅法合成方法以及聚乙烯亚胺和PDMS的水相常温合成方法。其次，利用PDMS接枝共聚物开发了溶剂型光固化自清洁涂料、低VOCs排放的水性自清洁涂料以及高固含量光固化自清洁涂料。最后通过调控溶剂型光固化自清洁涂料中组分比例与热处理时间，验证了图案化润湿表面免显影制备的可行性。