SiC曲面等离子体改性/固着磨料随形抛光方法研究

The silicon carbide (SiC) has the excellent properties of high hardness, high abrasion resistance, high resistance to corrosion and thermo-stability, etc. However, the forming process of SiC surfaces exists the problems of high difficulty in material removal, easy to fracture and low processing efficiency. To meet the urgent demands for the high precision SiC surfaces in optical, aerospace, automotive and several other hi-tech manufacturing fields, the ultra precision polishing, which is the final step for fabrication of SiC surface, is selected as the main target in this project. The academic thought and technological realization of shape-adaptive polishing plasma modified SiC surfaces with the complaisant bonnet adhered by rigid pellets is proposed for the first time, breaking through the traditional polishing methods for the hard/brittle materials. In order to polish SiC surface efficiently and without subsurface damage, the scientific problems are studied, including the modification mechanism of SiC by plasma implantation, the interface mechanism of shape-adaptive polishing SiC surfaces by fixed abrasive, and the synergistic mechanism between plasma modification and shape-adaptive polishing, etc. A novel complaisant bonnet polishing tool adhered by rigid pellets and a new shape-adaptive polishing device are developed. The key technologies owning proprieties intellectual property rights are obtained. This project provides the new theory and the new methods for non-damage polishing of SiC surfaces efficiently, which is of important significance for promoting the technological progress and industrial development of hard/brittle material surfaces.

碳化硅（SiC）材料具有高硬度、高耐磨性、高抗腐蚀性、耐高温等优异特性，但是SiC曲面成形过程存在材料去除难度大、表面易断裂损伤和加工效率低等问题。针对光学、航空航天、汽车以及其它高端制造领域对高精度SiC曲面的迫切需求，本项目选择SiC曲面制造过程中的最后一道工序——超精密抛光作为主攻目标，突破现有硬脆材料抛光方式，首次提出利用固着刚性丸片的柔性气囊对等离子体改性的SiC曲面进行随形抛光的学术思想和技术实现模式。以实现SiC表面的高效无损伤材料去除为目标，研究等离子体注入SiC材料的表面改性机理、固着磨料随形抛光SiC曲面的界面作用机理、等离子体改性与随形抛光的协同作用机制等科学问题，开发刚性丸片固着柔性气囊新工具与随形抛光新装置，取得拥有自主产权的关键技术。本项目的实施将为SiC曲面高效无损伤抛光提供新原理和新方法，为硬脆材料曲面的保形控性抛光提供重要的理论和技术支撑。

碳化硅（SiC）材料具有高硬度、高耐磨性、高抗腐蚀性、耐高温等优异特性，但是SiC曲面成形过程存在材料去除难度大、表面易断裂损伤和加工效率低等问题。针对光学、航空航天、汽车以及其它高端制造领域对高精度SiC曲面的迫切需求，本项目选择SiC曲面制造过程中的最后一道工序——超精密抛光作为主攻目标，突破现有硬脆材料抛光方式，首次利用柔性气囊对等离子体改性的SiC曲面进行随形抛光。本研究以实现SiC表面的高效无损伤材料去除为目标，研究了等离子体注入SiC材料的表面改性机理、气囊随形抛光SiC曲面的界面作用机理、等离子体改性与随形抛光的协同作用机制和工艺优化等科学问题，开发五轴联动气囊抛光机床、等离子辅助气囊抛光新工具和柔性力控法兰新装置，取得拥有自主产权的关键技术。本项目现已发表或录用SCI/EI论文10篇，申请国内发明专利3项，实用新型2项。