基于微偏心扫掠的射流抛光类脉冲去除函数创成机制研究

Fluid jet polishing has significant application prospect on ultra-precision processing of optical components which are used in modern high-power laser system, however, the optimizing, regulating and controlling technology of removal function is considered to be one of the most difficult bottleneck which restricts the development of fluid jet polishing. This project is based on the requirement of optical components ultra-precision processing to explore the new principle and new technology of impulse-like removal function creating based on rotation eccentric nozzle, the merits of fluid jet polishing is adsorbed according material, chemistry and mechanical acknowledge. It is planned to reveal the material removal mechanism in microcosmic dimension by researching the microcosmic action between abrasive particles and material. Clarify the technological parameters effects on surface topography creating of removal function through researching the distribution of the stress and abrasive particles on material surface. Propose the impulse-like removal function creating process based on the removal function model which was built on pre-research result. The technological experimentation is used to prove the theoretical research at last. This research has important realistic meaning and academic value on development of optical components ultra-precision processing.

射流抛光技术在现代高功率强激光系统光学元件超精密加工领域有着重要的应用前景，但适用于高精度射流抛光加工的去除函数创成及优化调控技术已成为制约其发展的瓶颈。本项目面向高功率强激光系统对光学元件的优质表面加工需求，结合射流抛光技术优点，将材料、力学及机械知识融入其中，探索基于微偏心喷嘴旋转扫掠创成射流抛光类脉冲去除函数新原理与新技术。研究射流抛光磨粒与工件材料微观作用行为，揭示材料微观去除机理；分析工件表面应力及磨粒分布，阐明工艺参数对去除函数形貌创成影响机制；结合工艺实验建立去除函数模型，基于该模型提出类脉冲去除函数创成与优化调控方案与策略，利用工艺实验对其进行验证。研究成果对发展光学元件超精密加工理论及工艺方法具有重要理论意义和应用价值。

射流抛光技术在现代高功率强激光系统光学元件超精密加工领域有着重要的应用前景 ，但适用于高精度射流抛光加工的去除函数创成及优化调控技术已成为制约其发展的瓶颈 。本项目面向高功率强激光系统对光学元件的优质表面加工需求，结合射流抛光技术优点 ，将材料、力学及机械知识融入其中，探索基于微偏心喷嘴旋转扫掠创成射流抛光类脉冲 去除函数新原理与新技术。.本项目针对射流抛光材料去除机理进行了分析，获得了用以描述液体与气体速度分布的连续相模型、用于计算磨粒运动轨迹的离散相模型和用于计算材料去除函数的磨损模型，基于射流抛光去除机理，分析了射流参数对射流抛光去除函数创成的影响机制；结合自研具有高稳定性的射流抛光试验系统对理论分析进行了验证，并对射流类脉冲去除函数优化调控工艺进行了研究。项目组最终获得了可初步用于射流抛光的去除函数形貌。通过本项目的研究，对发展光学元件超精密加工理论及工艺方法具有一定的理论意义和应用价值。