The task base on a experiment of WLED、tungsten halogen lamp、four main kinds of monochromatic irradiating specimen, binding the methods of materialogy and colorimetry to research quantitative relationship between the spectrum and exposure and damnification, then fitting periodic decay curve to micro structural aspects parameters of matrix and color parameters of pigment , the aim is provide theoretical and data basis for related research. Base on contrasting WLED curves to tungsten halogen lamp curve, researching quantitative impact of WLED against traditional sources then provide damage factor of WLED, the aim is providing scientific basis for applicability of WLED in museum lighting. Base on analysing change regulation of WLED curve to research threshold of exposure in painting and calligraphy lighting, then establishing a limited indexes to quantity lighting based on WLED illuminating painting and calligraphy, the aim is provide a support for revise lighting criteria on painting and calligraphy. Base on contrasting and analysing curves about four main kinds of monochromatic to research quantitative impact of monochromatic illuminating painting and calligraphy, then determine weight relationship to four kinds of monochromatic, the aim is obtaining the SPD of ideal WLED and then offering a support to R&D minimum damage source. The task is able to reduce the damage of artificial lighting to exhibits fundamentally, and solve the problem such as loss of historical information and reduction of estate value,scientific and practical significance of the research are stupendous.
课题基于WLED、卤钨灯、构成WLED四种主要单色光对书画试件影响实验,结合材料学与色度学方法,研究光源光谱、总曝光量、书画受损程度三者量化关系,拟合出书画基材微观形貌参数和颜料色彩参数随时间周期性衰变曲线,可为相关研究提供理论及数据基础;通过对比WLED、卤钨灯影响曲线,研究WLED较传统光源的量化影响程度,提出WLED相对损害系数,可为WLED在书画展陈照明中的实际适用性提供科学依据;通过分析WLED影响曲线变化规律,研究书画照明总曝光量限定阈值,建立基于WLED的书画照明数量限制指标群,可为书画展陈照明标准的修订提供依据;通过单色光影响曲线对比分析,研究单色光对书画损害量化程度,确定四种单色光影响权重关系,为获得理想WLED光谱能量分布,研发书画照明最小损伤光源提供支持。研究旨在保护文物原真性,避免或减小文物因照明所造成的历史信息失真和遗产价值降低的威胁,具有重要的科学与现实意义。
课题基于WLED、卤钨灯、构成WLED四种主要单色光对书画试件影响实验,结合材料学与色度学方法,研究光源光谱、总曝光量、书画受损程度三者量化关系,拟合出书画基材微观形貌参数和颜料色彩参数随时间周期性衰变曲线,可为相关研究提供理论及数据基础;通过对比WLED、卤钨灯影响曲线,研究WLED较传统光源的量化影响程度,提出WLED相对损害系数,可为WLED在书画展陈照明中的实际适用性提供科学依据;通过分析WLED影响曲线变化规律,研究书画照明总曝光量限定阈值,建立基于WLED的书画照明数量限制指标群,可为书画展陈照明标准的修订提供依据;通过单色光影响曲线对比分析,研究单色光对书画损害量化程度,确定四种单色光影响权重关系,为获得理想WLED光谱能量分布,研发书画照明最小损伤光源提供支持。研究旨在保护文物原真性,避免或减小文物因照明所造成的历史信息失真和遗产价值降低的威胁,具有重要的科学与现实意义。
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数据更新时间:2023-05-31
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