光敏聚合和液态光成像碱显影抗蚀剂的研究

Synthesized and optimized twenty four alkaline soluble forming-film resins in the three type resins.It have been found that epoxy o-cresol novolac acrylate resin modified by tetrahydrophthalic anhydride is the best one and have the optimum properties.Through the optimizing combination of fteen photoinitiators,seven co-initiators and more than twenty reactive diluent monomers,we have found that the photoinitiating system composed by morpholine-ketone,thioxanthone derivatives and co-initiator benefiting to overcome oxygeninhibition is highly efficient in the curing resist, and the monomer combination of hydroxyethyl mathacrylate,trimethylolpropanetriacrylate and dipentaerythritolpentaacrylate can improve the mechanical properties of the cured film.We have investigated the effect of every component on the properties of photoimagiong resist and have obtained a successful result that have been tranfered to Hunan AHDA Polymer New Materials Company..We helped the company to solve overpolymerization problem caused in producing epoxy novolac acrylate and the viscosity increasing problem in milling mixture component of photoimaging resist.Now,that company have produced hundreds kilo product of photoimaging alkaline development resist for printing circuit plate company and have obtained a satisfactory result,it will become falling into a market pattern product as well.This investigation have a guiding sense for developing photofunctional materials..Eleven papers have published and one PhD student has graduated during the investigation.

合成三类碱溶性成膜树脂，优选单、多官能团单体，探索电子转移机理复合光敏引发体系。通过光敏聚合动力学研究，找出光聚合规律，优选出最有效的光敏引发体系；再通过抗蚀剂组分结构结构和性能关系研究，获得高灵敏度、高分辨率，符合PCB制版要求的新一代光成窦钕杂耙禾故醇痢８貌牧隙缘缱庸ひ稻哂兄卮笠庖澹怨夤δ懿牧系难兄朴衅毡橹傅家庖濉