基于原子级光滑接触面的超耐磨损微/纳机电器件的理论及相关技术研究

Aiming at the common problems of wear and adhesion in the MEMS/NEMS devices, this project proposes the use of two atom-level-smooth contact crystalline surfaces relatively moving along some particular directions to realize innovative super wear-resistant micro/nano kinematic pairs and devices. Due to the two layer of atomic lattices relatively moving in the incommensurate state, this kind of super wear-resistant micro/nano devices based on the atom-level-smooth contact surfaces not only have the advantages of super wear-resistant and extra-low motion-resistance, but also have the characteristics of simple structures, no need for super-clean or vacuum environment and easy to batch production. This project utilizes graphite or other layer structure materials to batch manufacture the super wear-resistant micro/nano structures based on atom-level-smooth contact surfaces through micromachining methods, and then investigate the mechanism of the super wear-resistant and models, characterization of super high resolution, testing methods of wear properties and realization of the related micro/nano devices. Consequently, the theory and technology foundation of the innovative super wear-resistant MEMS/NEMS devices based on atom-level-smooth contact surfaces will be established. Besides, the high efficient and controllable drive methods and super high-resolution characterization methods developed in this project will play a certain role in promoting the research of nanometer tribology and related instruments.

针对微/纳机电器件中运动部件普遍存在的磨损、黏附等问题，本项目提出利用两个原子级光滑的晶体接触面沿某些特定方向相对运动实现晶格非公度，从而实现新型的超耐磨损的运动副和微纳机电器件。由于两层原子晶格在非公度状态下的相对运动，这种基于原子级光滑的运动接触副不仅超耐磨损、运动阻力极低，并且还具有结构简单、无需超净和真空环境、易批量制造等特点和优点。 本项目利用石墨等层状结构材料，采用微加工工艺实现原子级光滑接触面的超耐磨损微/纳结构的批量制造，研究这种新型微纳结构超耐磨损机制和模型，超高分辨表征和磨损特性测试方法以及相关器件的实现方法，从而建立基于原子级光滑接触面的新型超耐磨损微/纳机电器件的相关理论和技术基础。此外，本项目研究的高效、可控驱动及磨损状态超高分辨表征方法对纳米摩擦学以及相关仪器的研究也具有一定的促进作用。

磨损、黏附等问题普遍存在于微/纳机电器件中的运动部件，本项目研究利用两个原子级光滑的晶体接触面沿某些特定方向相对运动实现晶格间的非公度接触，从而实现新型的超耐磨损的运动副和微纳机电器件。首先，针对微纳开关、振荡器等微/纳机电器件的需求，提出利用两层单晶石墨材料作为微纳器件原子级光滑接触面结构，并发现当这种独特结构的上下晶面为非公度接触时，其具有超耐磨损特性。之后，研究微纳加工工艺实现原子级光滑接触面的超耐磨损微/纳结构的批量制造，同时，研究该结构作为超耐磨损微/纳器件的机制和模型。最后，研究了超耐磨损微纳结构及器件的超高分辨表征和磨损特性测试方法、实验系统搭建以及相关器件的实现方法。此外，本项目发展了一种新型的微纳胶滴打印技术，用于原子级光滑接触面的超耐磨损微/纳机电器件的工艺构筑。本研究得出的基于原子级光滑的运动接触副不仅超耐磨损、运动阻力极低，并且还具有结构简单、无需超净和真空环境、易实现批量制造等特点和优点。