纳米颗粒/有序介孔碳核壳结构粒子及其超精抛光机理研究

In recent years, optical technology has been widely used in areas of modern military and civil high-tech.There are more and more rigorous restrict to those optical components, requires excellent surface quality such as high surface precision, low surface/ subsurface roughness without adsorbingtheimpurities. And the bottleneck problem for improving the functional performance of optical elements is suppressing and eliminating the widely use of optics glass..Chemical mechanical polishing and magneto-rheological finishing have been extensive applied in efficient polishing technology for optical element, and the slurry abrasive plays important rolein surface/subsurface quality. In order to obtain the ideal surface with defect-free and inclusion-free, abrasive with nanoparticle/ordered mesoporous carbon core-shell structure will be fabricated. According to the unique structure, the hardness of abrasive will be reduced, and the particle dispersion will be improved, resulting in smaller normal stress and fewer surface/subsurface defects..Besides, the surface of ordered mesoporous carbon selectively absorb modified groups for facilitating the chemical reaction rate, and thus, polishing selectivity and material removal rate will be improved, meanwhile, the adsorption of impurity particle will be reduced. Finally, a new type of polishing slurry will be explored.

近年来，光学技术广泛应用于现代军事和民用高科技等领域，相关技术的不断进步对光学元件表面质量的要求也越来越高，表面/亚表面损伤的有效抑制和消除已经成为进一步提升光学元件使用性能的瓶颈问题。针对现有光学元件表面抛光技术中存在的问题，提出研制功能性纳米颗粒/有序介孔碳核壳结构抛光粒子以取代传统磨粒的新思路，以其较低的表面硬度有效控制抛光表面/亚表面损伤，并通过有序介孔碳表面的修饰基团选择性吸附、催化化学反应提高抛光去除速率，抑制表面颗粒吸附。研究新型抛光粒子物理化学效应、流体运动、化学机械作用的特殊规律，及其实现材料去除的机理。通过综合研究新型粒子抛光液特性、被抛光材料性质及抛光工艺参数等的相互关系，以流体力学、界面化学、摩擦化学等原理为基础，探索新型抛光液体系的高效、原子级抛光机理，为光学元件的超精表面制造提供技术和理论支持。

近年来，光学技术广泛应用于现代军事和民用高科技等领域，相关技术的不断进步对光学元件表面质量的要求也越来越高，表面/亚表面损伤的有效抑制和消除已经成为进一步提升光学元件使用性能的瓶颈问题。针对现有光学元件表面抛光技术中存在的问题，提出研制功能性纳米颗粒/有序介孔碳核壳结构抛光粒子以取代传统磨粒的新思路，丰富的介孔孔道有利于抛光颗粒对活性位的铆钉和携带能力，有利于熔石英表面抛光。通过对抛光液化学组分、抛光垫硬度与熔石英表面的物理化学性能进行匹配性设计，探索了化学机械抛光过程中熔石英表面微缺陷的形成机理；基本辨识出熔石英抛光过程中纳米抛光颗粒的运动规律，以及抛光工艺参数(压力、运动速度)、化学作用等因素对加工表面性质的影响，建立了熔石英抛光过程中缺陷控制的方法，为光学元件的超精表面制造提供技术和理论支持。