金属衬底上CVD石墨烯中褶皱的研究

Chemical vapor deposition (CVD) graphene has triggered unprecedented research enthusiasm recently due to its potential applications in microelectronic and optoelectronics devices. Wrinkle is a kind of common defect in CVD graphene on metallic substrate,however,few work was reported in this field. It has been found that the properties of CVD graphene could be degenerated by wrinkle. Hence, reducing or deleting the wrinkles in CVD graphene is an effective route for the quality improvement of CVD graphene. In this application, the structure and distribution of wrinkle and the effect of which on the material quality will be studied. Through the research, we will clarify the structure and distribution of wrinkles, the effect of wrinkles on the material quality and the relative mechanism, and found the crucial parameters that determine the distribution of wrinkle. To finally improve the material quality through decreasing the effect of wrinkles, we will design the growth parameter to adjust the structure and the distribution of wrinkle.

化学气相沉积（CVD）石墨烯薄膜在微电子和光电子领域有广泛的应用前景。褶皱是金属衬底上CVD石墨烯薄膜中普遍存在的一种缺陷，但是相关研究却很少。最近的研究发现，褶皱对CVD石墨烯的性能有较大影响，因此，减弱或消除褶皱的影响是进一步提高CVD石墨烯质量的一个有效途径。本申请拟对金属衬底上CVD石墨烯褶皱的结构、分布以及对材料电学和稳定性能的影响等开展系统研究，以期掌握褶皱的结构特点和分布规律，明确褶皱对材料电学和稳定性能的影响和相关机制，找到影响褶皱产生及分布的关键因素, 并在此基础上设计合理的生长工艺，调整褶皱的形貌和分布，以降低褶皱对材料性能的影响，最终进一步提高材料的质量。

化学气相沉积（CVD）石墨烯薄膜在微电子和光电子领域有广泛的应用前景。褶皱是金属衬底上CVD石墨烯薄膜中普遍存在的一种缺陷，但是相关研究却很少。最近的研究发现，褶皱对CVD石墨烯的性能有较大影响，因此，减弱或消除褶皱的影响是进一步提高CVD石墨烯质量的一个有效途径。本项目对铜上CVD石墨烯褶皱的结构、分布以及对材料电学和稳定性能的影响等开展了系统研究，掌握了褶皱的结构特点和分布规律，明确了褶皱对石墨烯抗氧化、抗腐蚀性能的影响和相关机制，找到了影响褶皱产生及分布的关键因素, 并在此基础上实现了褶皱的调控。本研究无论是对金属衬底上CVD石墨烯理论研究还是应用都具有重要意义。